The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 1979
Filed:
Jul. 21, 1977
Alonzo D Lafleur, Baton Rouge, LA (US);
John T Creehan, Baton Rouge, LA (US);
Robert E Baugh, Baton Rouge, LA (US);
Ormet Corporation, Burnside, LA (US);
Abstract
A method for sampling and controlling the addition of suspended gases, liquids and solids in a control stream to a process stream is disclosed wherein the surface area of the suspended material acts as the determining feature for control of the process. The measured surface area is compared with a preselected surface area to control the addition of the suspended material. This method is particularly useful for the control of particulate seed material to the process stream in the Bayer process for the production of alumina. The method is also broadly applicable to physical and/or chemical control means in an analytical scheme for controlling and monitoring any process.