The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 1979

Filed:

Aug. 17, 1977
Applicant:
Inventor:

Eberhard Krimmel, Pullach, DE;

Assignee:

Siemens Aktiengesellschaft, Berlin & Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K / ;
U.S. Cl.
CPC ...
2504 / ; 2504 / ;
Abstract

Implanted areas are produced on a substrate by irradiating the surface of the substrate with two coherent high kinetic energy beams which are superimposed in relation to one another and spaced from the substrate surface in such a manner that maxima and/or minima of an interference pattern formed by the two particle streams are located on the substrate surface.


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