The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 1978
Filed:
Jun. 24, 1976
Applicant:
Inventors:
Assignee:
Tokyo Shibaura Electric Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504 / ; 2504 / ;
Abstract
A method and apparatus for implanting radioactive gas in a base material which comprises the steps of conducting radioactive gas received in a reservoir to an ion source for ionization; accelerating said ionized radioactive gas into a high energy form; and implanting said high energy radioactive ion beam in a foil made of, for example, stainless steel, aluminium or copper and received in an ion implantation unit.