The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 1978
Filed:
Dec. 16, 1977
Francisco H De La Moneda, Reston, VA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An improved charge pumping device is disclosed for charge storage memory elements and substrate bias control. By selectively ion-implanting the substrate of the charge pump, its output current is substantially increased and its losses by charge dissipation are reduced. Charge pumps are used to charge a substrate-series capacitor combination to a desired bias point. In the substrate bias application, by integrating the series capacitor with the charge pump on the semiconductor chip and making the capacitor an integral part of a low resistance conductive blanket implant, the voltage regulation of the biasing circuit is improved.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile