The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 1978

Filed:

Jul. 17, 1975
Applicant:
Inventors:

Yew C Chang, Oakville, CA;

Stanford R Ovshinsky, Bloomfield Hills, MI (US);

Ronald W Citkowski, Pleasant Ridge, MI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
96 4 / ; 96 4 / ; 96 4 / ; 96 88 ;
Abstract

Selected areas of a layer comprising a tellurium tetrahalide imaging material, exemplified by tellurium tetrachloride, are subjected to the imaging effect of imaging energy, and of developing energy causing a chemical change in the tellurium tetrahalide imaging material in the imaged areas accompanied by a change in the detectable characteristic of the imaged areas. The aforesaid imaging material is extended in a matrix of a film-forming material together with a sensitizer. The application of the energy is advantageously effected in two steps, an imaging step employing imaging energy and producing a latent image, followed by a development step employing developing energy and producing the detectable recorded information or image.


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