The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 1977
Filed:
Oct. 09, 1975
Applicant:
Inventors:
Jurgen Graul, Gruenwald, DT;
Helmuth Murrmann, Ottobrunn, DT;
Assignee:
Siemens Aktiengesellschaft, Berlin & Munich, DT;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
148-15 ; 29578 ; 148174 ; 148188 ; 357 59 ; 357 91 ;
Abstract
A semiconductor body is coated at selected areas thereof with a polycrystalline or amorphous semiconductor layer, a dopant is ion-implanted into such polycrystalline or amorphous layer and the resultant structure is then subjected to diffusion conditions to diffuse the dopant from the polycrystalline or amorphous layer into the select zone of the semiconductor body. This process causes very slight disturbances in the crystal lattice of the semiconductor body and provides an adjustable dopant concentration at select surface zones of the semiconductor body.