The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 1977
Filed:
Aug. 16, 1976
Sidney Ivor Ingrey, Alymer, CA;
Heinz Josef Nentwich, Ottawa, CA;
Robert Gordon Poulsen, Ottawa, CA;
Northern Telecom Limited, Montreal, CA;
Abstract
Gaseous plasma etching of aluminum with conventional plasma etch gases has not hitherto been commercially possible due to a layer of aluminum oxide (Al.sub.2 O.sub.3) which forms on freshly prepared aluminum surfaces. By first plasma etching in the presence of a gaseous trihalide, preferably in a so-called 'pancake' or radial-flow type reactor, the oxide layer is removed. Aluminum etching can then continue, either with or without plasma conditions, depending upon the etch gas used.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile