The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 1977
Filed:
Oct. 28, 1975
Applicant:
Inventors:
Yoshio Hom-Ma, Kokubunji, JA;
Tadao Kaji, Tokyo, JA;
Assignee:
Hitachi, Ltd., , JA;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
2041 / ; 156625 ; 156643 ; 156664 ; 156655 ; 156656 ;
Abstract
An even surface of an SiO.sub.2 layer on an Si body, whose surface is uneven, is obtained by the steps of forming a photoresist layer of KTFR (Trade name of Eastman Kodak Chemical Company) on the uneven surface of the SiO.sub.2 layer so as to have a thickness sufficient cover the unevenness of the surface and etching the SiO.sub.2 layer with said KTFR layer by rf sputter etching so as to expose a predetermined surface of the SiO.sub.2 layer.