The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 1977
Filed:
Jun. 02, 1975
Applicant:
Inventors:
Teruaki Aoki, Tokyo, JA;
Hisayoshi Yamoto, Hatano, JA;
Masanori Okayama, Hatano, JA;
Yoshimi Hirata, Atsugi, JA;
Shuichi Sato, Chofu, JA;
Takaaki Yamada, Atsugi, JA;
Assignee:
Sony Corporation, Tokyo, JA;
Primary Examiner:
Int. Cl.
CPC ...
H01C / ;
U.S. Cl.
CPC ...
338309 ; 338314 ; 338308 ; 357 23 ; 357 51 ; 357 59 ; 427 93 ; 427 95 ; 427101 ;
Abstract
A thin film resistor is formed of polycrystalline silicon which contains 2 to 45 atomic percent of oxygen and wherein the resistivity of the polycrystalline silicon film varies as a function of the amount of oxygen contained in the film and wherein the resistivity is substantially higher than polycrystalline silicon not containing oxygen.