The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 1976
Filed:
Mar. 20, 1975
Herbert Von Hartel, Lexington, MA (US);
Coulter Information Systems, Inc., Bedford, MA (US);
Abstract
In a sputtering chamber where there is at least one target of some material comprising at least two elements which are to be sputtered as a compound onto a substrate within the chamber, a target having a plurality of edges is framed by a metallic shield to confine the sputtering to a forward direction and the background gas needed for maintaining stoichiometry of the sputtered material is injected directly inside of the shield so that immediately upon entry into the chamber a substantial portion thereof flows over the target. A perforated manifold running the length of an edge of the target releases the background gas to the target along its length.