The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 1976
Filed:
Jan. 20, 1975
Applicant:
Inventors:
Assignee:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
148187 ; 29576 ;
Abstract
A silicon dioxide film and a silicon nitride film are successively vapor-deposited on a main face of an N type silicon substrate processed with H.sub.2 O.sub.2 water. Those portions of both films underlaid by a P type region to be subsequently formed and their peripheral portions are selectively removed. Then a P type impurity is diffused into the central exposed portion of the main substrate face to form the P type region with a PN junction having a termination facing the silicon dioxide film. Also a silicon dioxide film is thermally formed on the peripheral exposed portion of the main face.