The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2026

Filed:

Jun. 30, 2023
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Ruilong Xie, Niskayuna, NY (US);

Nicholas Anthony Lanzillo, Wynantskill, NY (US);

Brent A. Anderson, Jericho, VT (US);

Albert M. Chu, Nashua, NH (US);

Lawrence A. Clevenger, Saratoga Springs, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10W 20/41 (2026.01); H10W 20/00 (2026.01);
U.S. Cl.
CPC ...
H10W 20/427 (2026.01); H10W 20/01 (2026.01);
Abstract

A semiconductor structure including a device layer, a back end-of-line layer, and a backside power distribution layer. The backside power distribution layer includes a first line network with having a first pitch, and a second line network having a second pitch. The second pitch is greater than the first pitch. In one example, the second pitch is at least 7 times (7×) greater than the first pitch.


Find Patent Forward Citations

Quick Actions:

Xie, Ruilong. (2026). Pitch change between metal lines (U.S. Patent No. 12796438). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12796438

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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