The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2026

Filed:

Dec. 08, 2022
Applicants:

Hamamatsu Photonics K.k., Shizuoka, JP;

Energetiq Technology, Inc., Wilmington, MA (US);

Inventors:

Donald K. Smith, Newton, MA (US);

Stephen F. Horne, Medford, MA (US);

Michael J. Roderick, Everett, MA (US);

Kosuke Saito, Hamamatsu, JP;

Wolfram Neff, Woburn, MA (US);

Assignees:

Hamamatsu Photonics K.K., Shizuoka, JP;

Energetiq Technology, Inc., Wilmington, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); H01J 37/24 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H05G 2/002 (2024.08); H01J 37/241 (2013.01); H01J 37/32449 (2013.01); H01J 37/32623 (2013.01); H01J 37/32834 (2013.01);
Abstract

An ultraviolet light source with direct feed gas injection includes a chamber comprising a plasma confinement region and defining an aperture adjacent to the plasma confinement region that passes light generated by the plasma. A magnetic core is positioned around the plasma confinement region and is configured to generate a plurality of plasma current loops that converges in the plasma confinement region during operation. A feed gas injector is coupled to a gas port in the chamber and has an output that is positioned proximate to a boundary of the plasma confinement region so that the feed gas injector provides a feed gas to the plasma confinement region that creates a differential pressure in the plasma confinement region. A high voltage region is coupled to the plasma confinement region. An exhaust port is configured to be coupled to a pump that controls a pressure in the chamber.


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Smith, Donald. (2026). Inductively coupled plasma light source with direct gas injection (U.S. Patent No. 12795805). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12795805

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