Plasma generator and injector assembly for a processing chamber, and related methods

Abstract

Embodiments of the present disclosure generally relate to plasma generator and injector assembly for use in a processing chamber. In one or more embodiments, a substrate processing chamber includes a chamber body at least partially defining an internal volume. The processing chamber further includes a plasma generator including a first housing to deliver a generation power and a second housing coupled to the first housing to at least partially define a plasma volume between the second housing and the first housing. A gas inlet extends through the second housing to the plasma volume. The gas inlet is configured to be fluidly coupled to a gas source. An injector is fluidly connected to the plasma generator. The injector includes one or more openings arranged in one or more channels. A mount arm includes a first end section coupled to the injector and a second end section coupled to the second housing.