Image simulation for semiconductor examination

Abstract

There is provided a system and method of image simulation for a semiconductor specimen. The method includes obtaining design data, and a plurality of actual images of the specimen acquired by an examination tool under a plurality of imaging configurations; processing the design data, the plurality of imaging configurations and the plurality of actual images by a first machine learning (ML) model, to obtain a set of estimated values for a set of physical properties characterizing the specimen, the physical properties being expected to result in varied image responses upon the specimen being imaged under different imaging configurations of the examination tool; and processing, by a second ML model, the design data, the set of estimated values, and a group of new imaging configurations of the examination tool, to obtain a group of synthetic images of the specimen simulating actual images acquired under the group of new imaging configurations.