The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2026
Filed:
Mar. 30, 2022
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Wakayama University, Wakayama, JP;
Takenori Watabe, Annaka, JP;
Hiroshi Hashigami, Annaka, JP;
Takahiro Sakatsume, Takasaki, JP;
Kazuyuki Uno, Izumi, JP;
Marika Ohta, Fukuyama, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
WAKAYAMA UNIVERSITY, Wakayama, JP;
Abstract
A method of producing a raw material solution for a film-forming according to a Mist CVD method including a temperature at which a solute containing a metallic element is mixed with a solvent and stirred is 30° C. or higher, and a method of film-forming according to the Mist CVD method using a raw material solution produced by the method of producing the raw material solution.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile