The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2026

Filed:

Mar. 30, 2022
Applicants:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Wakayama University, Wakayama, JP;

Inventors:

Takenori Watabe, Annaka, JP;

Hiroshi Hashigami, Annaka, JP;

Takahiro Sakatsume, Takasaki, JP;

Kazuyuki Uno, Izumi, JP;

Marika Ohta, Fukuyama, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/40 (2006.01); C23C 16/448 (2006.01); H01L 21/16 (2006.01); H10P 14/20 (2026.01); H10P 14/24 (2026.01); H10P 14/60 (2026.01); H10P 14/692 (2026.01);
U.S. Cl.
CPC ...
C23C 16/4486 (2013.01); C23C 16/40 (2013.01); C23C 16/403 (2013.01); H10P 14/24 (2026.01); H10P 14/3434 (2026.01); H10P 14/6334 (2026.01); H10P 14/69391 (2026.01);
Abstract

A method of producing a raw material solution for a film-forming according to a Mist CVD method including a temperature at which a solute containing a metallic element is mixed with a solvent and stirred is 30° C. or higher, and a method of film-forming according to the Mist CVD method using a raw material solution produced by the method of producing the raw material solution.


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Watabe, Takenori. (2026). Method of producing raw material solution, method of film-forming and production lot (U.S. Patent No. 12790688). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12790688

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