The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2026

Filed:

Oct. 04, 2024
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Viljami J. Pore, Helsinki, FI;

Marko Tuominen, Helsinki, FI;

Hannu Huotari, Helsinki, FI;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/00 (2006.01); B05D 1/36 (2006.01); C23C 16/30 (2006.01); C23C 16/455 (2006.01); H10P 14/60 (2026.01); H10P 14/68 (2026.01); H10P 72/00 (2026.01); B05D 3/14 (2006.01);
U.S. Cl.
CPC ...
B05D 1/60 (2013.01); B05D 1/36 (2013.01); C23C 16/30 (2013.01); C23C 16/45523 (2013.01); C23C 16/45525 (2013.01); H10P 14/6334 (2026.01); H10P 14/6339 (2026.01); H10P 14/6532 (2026.01); H10P 14/683 (2026.01); H10P 72/00 (2026.01); B05D 3/145 (2013.01); B05D 2505/50 (2013.01);
Abstract

Methods for vapor depositing organic films include: (a) vaporizing a first organic reactant in a vaporizer at a temperature A to form a first reactant vapor; (b) exposing a substrate in a reaction space to the first reactant vapor, wherein the substrate is at a temperature B, the temperature B being lower than the temperature A; and (c) depositing the organic film on the substrate. The substrate may include a non-planar topography having three-dimensional structures including a plurality of trenches extending inwardly from a surface of the substrate. The depositing may include depositing a first thickness on a lower feature of the substrate within the plurality of trenches and depositing a second thickness on an upper field region of the substrate outside the plurality of trenches, wherein the first thickness is greater than the second thickness.


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Pore, Viljami. (2026). Vapor phase deposition of organic films (U.S. Patent No. 12789227). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12789227

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