The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
Jul. 02, 2024
Tokyo Electron Limited, Tokyo, JP;
Alec Dorfner, Albany, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method for processing a substrate includes receiving the substrate on a substrate holder disposed in a processing chamber, the substrate including a layer to be processed and a patterned mask disposed over the layer to be processed. The method further includes flowing a processing gas into the processing chamber, and replacing a material of the patterned mask with a metal of the processing gas to form a metal patterned mask occupying a same location as the patterned mask. And the method further includes etching, using the metal patterned mask as an etch mask, the layer to be processed to form a patterned layer, the patterned layer including feature openings.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile