The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2026

Filed:

Jun. 28, 2023
Applicant:

Intel Ndtm Us Llc, Santa Clara, CA (US);

Inventors:

Jong Sun Sel, Dalian, CN;

Yao Xing, Dalian, CN;

Long Chen, Dalian, CN;

Hoon Koh, San Jose, CA (US);

Wenwu Zhu, Dalian, CN;

Anil Chandolu, Boise, ID (US);

Assignee:

Intel NDTM US LLC, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 41/10 (2023.01); H10B 41/27 (2023.01); H10B 43/10 (2023.01); H10B 43/27 (2023.01);
U.S. Cl.
CPC ...
H10B 41/10 (2023.02); H10B 41/27 (2023.02); H10B 43/10 (2023.02); H10B 43/27 (2023.02);
Abstract

Methods and apparatus for pillar bending improvement by cut tiers pattern implementation. The method uses a cut tier pattern in a staircase region of a 3D memory structure to reduce pillar bending in a pillar array region. The pillar array region includes a plurality of memory tiers comprising wordline layers interposed between isolation layers, where a memory tier comprises a two-dimensional (2D) array of memory cells. A plurality of vertical structures comprising pillars pass through memory cells in the wordline layers and pass through the isolation layers. The staircase structure is disposed adjacent to the pillar array region and includes vertical wordline drivers coupled to the wordline layers. A cut tier pattern comprising vertical trenches is formed in the staircase structure toward a side of the staircase structure adjacent to the pillar array region. The cut tier pattern includes one or more breaks used for routing circuitry in the wordlines.


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Sel, Jong. (2026). Method for pillar bending improvement by cut tiers pattern implementation (U.S. Patent No. 12787272). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12787272

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