The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
Mar. 25, 2022
Rigaku Corporation, Tokyo, JP;
Takumi Ota, Tokyo, JP;
RIGAKU CORPORATION, Tokyo, JP;
Abstract
A correction apparatus reduces calculation costs for correcting artifacts due to a beam hardening effect in reconstructing a CT image by correcting an artifact due to a beam hardening effect caused in reconstructing a CT image. The correction apparatus includes processing circuitry configured to acquire an incident X-ray distribution, acquire a linear absorption coefficient model representing an energy dependency of a linear absorption coefficient by a scale factor including a parameter, acquire a projection image, and correct the projection image using the incident X-ray distribution and the linear absorption coefficient model.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile