logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12781343 B1

PDFFull Text
Date of Patent:
Nov. 03, 2026

Filed:

Dec. 23, 2025

Method for tungsten-based thin film deposition via fabrication and decomposition of precursor metastable complexes (molecular species)

Applicant:

Kalark Nanostructure Sciences Inc., Doylestown, PA (US);

Inventors:

Barry C. Arkles, Pipersville, PA (US);

Alain E. Kaloyeros, Slingerlands, NY (US);

Assignee:

KALARK NANOSTRUCTURE SCIENCES INC., Doylestown, PA (US);

Attorney:

Panitch Schwarze Belisario & Nadel LLP

Primary Examiner:

Hai Y Zhang

Int. Cl.
CPC ...
C23C 16/52 (2006.01); C23C 16/448 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4488 (2013.01); C23C 16/45536 (2013.01); C23C 16/45553 (2013.01); C23C 16/52 (2013.01);
Abstract

A method and system are provided for the low temperature deposition of tungsten (W) and W-based thin films through the planned and engineered ex-situ or in-situ creation of vapor phase metastable clusters or metastable complexes to achieve precise film conformality, composition, morphology, structure, and thickness. The tungsten based thin film deposition techniques include chemical vapor deposition (CVD), atomic layer deposition (ALD), pulsed CVD, molecular layer deposition (MLD), self-assembled monolayer (SAM) deposition, and Click chemistry deposition (CCD).

Find Patent Forward Citations

Quick Actions:

Arkles, Barry. (2026). Method for tungsten-based thin film deposition via fabrication and decomposition of precursor metastable complexes (molecular species) (U.S. Patent No. 12781343). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12781343

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…