The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2026

Filed:

Oct. 25, 2023
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Naoki Matsumoto, Miyagi, JP;

Mitsunori Ohata, Miyagi, JP;

Masataka Masuyama, Miyagi, JP;

Naoki Mihara, Miyagi, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32724 (2013.01); H01J 37/32174 (2013.01); H01J 37/32568 (2013.01);
Abstract

There is provided a lower electrode mechanism for plasma processing, the lower electrode mechanism including: a base portion to which radio-frequency power is applied during the plasma processing; a dielectric portion disposed at an upper surface of the base portion; and an induction heating mechanism, in which the induction heating mechanism includes an induction heating element heated by an induction magnetic field, and a magnetic field generator that is disposed inside the base portion and generates the induction magnetic field.


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Matsumoto, Naoki. (2026). Lower electrode mechanism and substrate processing method (U.S. Patent No. 12776480). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12776480

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