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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12774400 B1

PDFFull Text
Date of Patent:
Oct. 27, 2026

Filed:

Oct. 30, 2023

Positively charged abrasive with negatively charged ionic oxidizer for polishing application

Applicant:

Cmc Materials Llc, Aurora, IL (US);

Inventors:

Tsuyoshi Masuda, Tsu, JP;

Ryuta Kumashiro, Tsu, JP;

Hironao Fujii, Tsu, JP;

Takamasa Kanai, Tsu, JP;

Hiroshi Kitamura, Tsu, JP;

Helin Huang, Aurora, IL (US);

Yoshiyuki Matsumura, Kashihara, JP;

Assignee:

CMC Materials LLC, Aurora, IL (US);

Attorney:
Primary Examiner:

Jiong-Ping Lu

Int. Cl.
CPC ...
H10P 52/40 (2026.01); B24B 1/00 (2006.01); B24B 37/04 (2012.01); C09G 1/00 (2006.01); C09G 1/02 (2006.01); C09K 3/14 (2006.01); C09K 13/00 (2006.01); C09K 13/04 (2006.01); H10P 70/00 (2026.01); H10P 90/00 (2026.01); H10P 95/00 (2026.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 1/00 (2013.01); B24B 37/044 (2013.01); C09G 1/00 (2013.01); C09K 3/1436 (2013.01); C09K 3/1463 (2013.01); C09K 13/00 (2013.01); C09K 13/04 (2013.01); H10P 52/402 (2026.01); H10P 52/403 (2026.01); H10P 70/237 (2026.01); H10P 90/129 (2026.01); H10P 95/06 (2026.01);
Abstract

The invention provides a chemical-mechanical polishing composition comprising: (a) an abrasive particle; (b) an ionic oxidizer; and (c) water, wherein the chemical-mechanical polishing composition has a pH of about 1 to about 7, the abrasive particle has an isoelectric point that is higher than 8, and the ionic oxidizer has a negative charge at the pH of the chemical-mechanical polishing composition. The invention also provides a method of chemically-mechanically polishing a substrate, especially a substrate comprising a silicon carbide layer on a surface of the substrate, using said composition.

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Masuda, Tsuyoshi. (2026). Positively charged abrasive with negatively charged ionic oxidizer for polishing application (U.S. Patent No. 12774400). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12774400

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