The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Feb. 21, 2023
Applicant:

Winbond Electronics Corp., Taichung City, TW;

Inventors:

Chiao-Ling Hsu, Taichung City, TW;

Li-Chien Wang, Taichung City, TW;

Assignee:

Winbond Electronics Corp., Taichung City, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10W 46/00 (2026.01); G03F 7/00 (2006.01); G03F 9/00 (2006.01); H10W 20/00 (2026.01);
U.S. Cl.
CPC ...
H10W 46/00 (2026.01); G03F 7/70683 (2013.01); G03F 9/7076 (2013.01); H10W 20/069 (2026.01); H10W 46/301 (2026.01);
Abstract

A self-aligned multiple patterning mark is provided. The mark includes a group of patterns disposed on the substrate and a cover layer. The group of patterns includes a plurality of strip patterns extending in a first direction and arranged parallel to each other, and the ends of two adjacent strip patterns are connected to each other to form an independent ring. The cover layer is disposed on the substrate and covers the group of patterns. The cover layer has an opening extending in a second direction across the first direction, and the cover layer covers two opposite ends of each strip pattern.


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Quick Actions:

Hsu, Chiao-Ling. (2026). Self-aligned multiple patterning mark (U.S. Patent No. 12772862). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12772862

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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