The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Feb. 07, 2024
Applicant:

City University of Hong Kong, Hong Kong, HK;

Inventors:

Shien-Ping Feng, Hong Kong, HK;

Chih-Chun Chung, Hong Kong, HK;

Sheng-Jye Cherng, Hong Kong, HK;

Kaiyu Mu, Hong Kong, HK;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10W 20/44 (2026.01); H10W 20/00 (2026.01); H10W 20/43 (2026.01); H10W 74/01 (2026.01); H10W 74/10 (2026.01);
U.S. Cl.
CPC ...
H10W 20/4421 (2026.01); H10W 20/056 (2026.01); H10W 20/081 (2026.01); H10W 20/43 (2026.01); H10W 74/01 (2026.01);
Abstract

The present invention introduces a composite copper (Cu) structure that combines fine grains and nanotwins, providing structural stability and effective resistance to surface damage even after extended periods. This offers a promising solution for achieving finer Redistribution Layer (RDL) in advanced packaging technologies, with a longer electromigration lifetime compared to regular coarse-grain lines.


Find Patent Forward Citations

Quick Actions:

Feng, Shien-Ping. (2026). Ic package with nanotwinning-assisted structurally stable copper structure (U.S. Patent No. 12772835). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12772835

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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