The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Nov. 27, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sangjine Park, Suwon-si, KR;

Jihwan Park, Suwon-si, KR;

Kuntack Lee, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/00 (2026.01); H10P 72/50 (2026.01); H10P 76/20 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0606 (2026.01); H10P 72/0402 (2026.01); H10P 72/0431 (2026.01); H10P 72/0462 (2026.01); H10P 72/0604 (2026.01); H10P 72/53 (2026.01); H10P 76/2041 (2026.01);
Abstract

Provided is a substrate processing apparatus including a processing container having a processing space, a substrate support configured to support a substrate, a fluid supplier configured to supply a processing fluid in a supercritical state to the processing space, a shower head assembly configured to diffuse the processing fluid, a first laser portion configured to measure a horizontal alignment between the processing container and the shower head assembly, a second laser portion configured to measure a vertical alignment between the processing container and the shower head assembly, and a controller configured to correct the position of one of the substrate, the shower head assembly, and the processing container, based on the measured horizontal and vertical alignments, wherein the first and second laser portions are configured to be positioned within the processing container and to move above the substrate.


Find Patent Forward Citations

Park, Sangjine. (2026). Substrate processing apparatus and substrate processing method (U.S. Patent No. 12772782). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12772782

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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