The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Feb. 13, 2023
Applicant:

Tosoh Smd, Inc., Grove City, OH (US);

Inventors:

Eduardo Del Rio Perez, Dublin, OH (US);

Harrison Collin Whitt, Grove City, OH (US);

Assignee:

TOSOH SMD, INC., Grove City, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); B22D 7/00 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3426 (2013.01); B22D 7/005 (2013.01); C23C 14/3407 (2013.01); C23C 14/3414 (2013.01); H01J 37/3491 (2013.01);
Abstract

Provided are copper and copper alloy sputtering targets and sputtering target assemblies, including copper-sulfur sputtering targets, and systems and methods thereof. The copper and copper alloy sputtering targets, including copper-sulfur sputtering targets may have one or more (or all) of the following properties: high purity, uniform composition and distribution, increased or requisite mechanical stability to provide joining mechanisms, and the like. In an embodiment, the sulfur-doped copper alloy compositions and sputtering targets may have a purity of 99.999 wt % or more and/or a uniform composition of sulfur up to 5 wt %.


Find Patent Forward Citations

Del Rio Perez, Eduardo. (2026). High purity sulfur-doped copper sputtering target assembly and method for producing same (U.S. Patent No. 12770846). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12770846

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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