Mechanism for filtering etching byproduct during semiconductor fabrication and method thereof

Abstract

The present disclosure provides a mechanism for filtering an etching byproduct during semiconductor fabrication. The mechanism includes: an etching tool, configured to etch a portion of a material layer and having an outlet for discharging the etching byproduct formed from the etched portion of the material layer; a pipeline, for allowing the etching byproduct to flow through, the pipeline having a first end connected to the outlet of the etching tool and a second end distal to the first end and the etching tool; and a filter, disposed between the first end and the second end and configured to filter the etching byproduct. The filter includes a solidifier configured to solidify the etching byproduct by freezing or heating, and a medium configured to retain the etching byproduct solidified by the solidifier.