The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Oct. 16, 2024
Tokyo Electron Limited, Tokyo, JP;
Yohei Matsumoto, Iwate, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma control method includes: providing a plasma processing apparatus including a control unit and a process unit, receiving an input of a recipe in which values of a plurality of parameters are set for each processing step; determining a value of a variable parameter based on a progress state of the film forming processing when the plurality of parameters of the recipe include the variable parameter; and performing a film forming processing in the process unit based on the values of the plurality of parameters set in the recipe and the determined value of the variable parameter determined in the determining.
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