The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Mar. 25, 2022
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Yasuaki Taniike, Nirasaki City, JP;

Masaki Hirayama, Tokyo, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32082 (2013.01); H01J 37/3244 (2013.01); H01J 37/32568 (2013.01); H01J 2237/002 (2013.01); H01J 2237/334 (2013.01);
Abstract

In a disclosed plasma processing apparatus, a metallic gas pipe extends in a direction crossing a coaxial waveguide and is connected to an inner conductor of the coaxial waveguide between one end and the other end of the inner conductor. The gas pipe is connected to a gas flow path of the inner conductor. The plasma processing apparatus includes a filter configured to prevent electromagnetic waves from propagating around the gas pipe. The filter includes a cylindrical cover conductor provided to surround the gas pipe. The cover conductor includes one end connected to an outer conductor of the coaxial waveguide and the other end that is a short-circuit end connected to the gas pipe.


Find Patent Forward Citations

Taniike, Yasuaki. (2026). Plasma processing apparatus (U.S. Patent No. 12770825). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12770825

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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