The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Mar. 19, 2024
Nvidia Corporation, Santa Clara, CA (US);
Hsin Miao, San Francisco, CA (US);
Sergei Lupashin, Zurich, CH;
Ayon Sen, Santa Clara, CA (US);
Yue Wu, Mountain View, CA (US);
Gang Pan, Fremont, CA (US);
Art Tevs, Oberlunkhofen, CH;
Minwoo Park, Saratoga, CA (US);
NVIDIA Corporation, Santa Clara, CA (US);
Abstract
In various examples, epipolar constraint-based cross-camera calibration validation is disclosed. For a pair of cameras that have partially overlapping fields of view, a shared region of their overlapping fields of view may be extracted and used as the basis to perform an epipolar constraint-guided feature descriptor matching process. A camera calibration metric may be computed based on the degree to which a feature descriptor appearing at a pixel of the first image aligns as expected in the second image with an epipolar line associated with the pixel of the first image, where the epipolar line is computed using extrinsic camera calibration parameters associated with the pair of cameras. Epipolar matching may be performed for a plurality of feature points and an aggregate validation score computed based on measuring the computed deviations for each feature. A sensitivity analysis may be applied to better assess the usefulness of the validation score.
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