The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Jan. 05, 2023
Realtek Semiconductor Corp., Hsinchu, TW;
REALTEK SEMICONDUCTOR CORP., Hsinchu, TW;
Abstract
A margin correction method and a margin correction system for static timing analysis are provided. The margin calibration method includes: measuring dies on a to-be-tested chip with a target circuit to obtain performance data records; obtaining simulation data records for simulating performances of the dies; executing a static timing analysis (STA) tool to obtain timing analysis results; statistically calculating a simulation process corner based on the timing analysis results; obtaining a measurement process corner based on the performance data records; establishing a statistical model that defines a margin as a difference between the measurement process corner and the simulation process corner; substituting the timing analysis results and the measurement process corner into the statistical model and execute a model fitting algorithm, for fitting the statistical model to a target model to obtain the margin; and obtaining calibrated timing analysis results.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile