The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Nov. 13, 2024
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Thomas James Dunn, Penfield, NY (US);

Steven James Van Kerkhove, Webster, NY (US);

Assignee:

CORNING INCORPORATED, Corning, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/30 (2006.01); G03F 7/00 (2006.01); G01B 5/00 (2006.01); H10P 74/20 (2026.01);
U.S. Cl.
CPC ...
G01B 11/303 (2013.01); G03F 7/70508 (2013.01); G03F 7/70775 (2013.01); G01B 5/0016 (2013.01); G05B 2219/37402 (2013.01); H10P 74/203 (2026.01);
Abstract

A method of determining a flatness of a substrate, the method including measuring a first flatness measurement of the substrate at a first orientation relative to a vertical direction, measuring a second flatness measurement of the substrate at a second orientation relative to the vertical direction, measuring a third flatness measurement of the substrate at a third orientation relative to a vertical direction, and measuring a fourth flatness measurement of the substrate at a fourth orientation relative to a vertical direction, each of the first orientation, the second orientation, the third orientation, and the fourth orientation being at a different orientation relative to the vertical direction. The method further including generating a first set of differences, fitting the first set of differences to respective orthogonal polynomials, and generating a true flatness of the substrate.


Find Patent Forward Citations

Quick Actions:

Dunn, Thomas. (2026). Flatness error resistant photomask measurement techniques (U.S. Patent No. 12768647). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12768647

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…