The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Jan. 10, 2023
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); F26B 3/04 (2006.01); F26B 5/00 (2006.01); F26B 5/04 (2006.01); F26B 9/06 (2006.01); F26B 21/10 (2006.01); F26B 21/14 (2006.01); G03F 7/20 (2006.01); H10P 70/00 (2026.01);
U.S. Cl.
CPC ...
F26B 5/005 (2013.01); F26B 5/04 (2013.01); G03F 7/2024 (2013.01); H10P 70/20 (2026.01);
Abstract
A method of processing a substrate includes disposing a substrate in a drying chamber, and supplying a fluid into the drying chamber in which the substrate is disposed. The supplying of the fluid into the drying chamber includes supplying a gas into the drying chamber, and supplying a supercritical fluid into the drying chamber after the supplying of the gas is started.
Park, Sangjine. (2026). Substrate processing apparatus and method of processing a substrate using the same (U.S. Patent No. 12768593). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12768593
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile