The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Jan. 20, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Jeffrey W. Anthis, Redwood City, CA (US);
Nasrin Kazem, Santa Clara, CA (US);
Lakmal Charidu Kalutarage, San Jose, CA (US);
Jayden Stephen John Shackerley Potter, Menlo Park, CA (US);
Thomas Joseph Knisley, Livonia, MI (US);
Lisa Enman, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/40 (2006.01); H01B 1/08 (2006.01); H10H 20/833 (2025.01); H10P 14/40 (2026.01); H10H 20/01 (2025.01); H10P 14/43 (2026.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C23C 16/405 (2013.01); C23C 16/45525 (2013.01); C23C 16/45536 (2013.01); H01B 1/08 (2013.01); H10H 20/833 (2025.01); H10P 14/418 (2026.01); H10H 20/032 (2025.01); H10P 14/432 (2026.01);
Abstract
A method includes depositing a coating including stoichiometric one-to-one ruthenium oxide (RuO) onto a surface of a substrate. The coating is deposited by performing an atomic layer deposition (ALD) process using at least one precursor.
Anthis, Jeffrey. (2026). Atomic layer deposition of ruthenium oxide coatings (U.S. Patent No. 12768040). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12768040
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile