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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12767908 B1

PDFFull Text
Date of Patent:
Oct. 20, 2026

Filed:

Dec. 01, 2023

Treatment liquid, cleaning method of semiconductor substrate, and manufacturing method of semiconductor element

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Nobuaki Sugimura, Haibara-gun, JP;

Tetsuya Kamimura, Haibara-gun, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Brian P Mruk

Int. Cl.
CPC ...
C11D 1/60 (2006.01); C11D 1/62 (2006.01); C11D 1/72 (2006.01); C11D 3/00 (2006.01); C11D 3/26 (2006.01); C11D 3/30 (2006.01); C11D 3/34 (2006.01); C11D 3/36 (2006.01); H10P 70/00 (2026.01);
U.S. Cl.
CPC ...
C11D 3/30 (2013.01); C11D 3/0047 (2013.01); C11D 3/3472 (2013.01); H10P 70/237 (2026.01); H10P 70/277 (2026.01); C11D 2111/22 (2024.01); C11D 2111/44 (2024.01);
Abstract

An object of the present invention is to provide a treatment liquid having excellent removability of a hydrophobic anticorrosion agent and excellent suppression property of copper surface roughness, a cleaning method of a semiconductor substrate, and a manufacturing method of a semiconductor element. The treatment liquid of the present invention contains at least one specific compound selected from the group consisting of a quaternary ammonium compound including a quaternary ammonium cation having a total number of carbon atoms of 5 or more and a quaternary phosphonium compound including a quaternary phosphonium cation having a total number of carbon atoms of 5 or more, a sulfur-containing compound, and a solvent.

Find Patent Forward Citations

Sugimura, Nobuaki. (2026). Treatment liquid, cleaning method of semiconductor substrate, and manufacturing method of semiconductor element (U.S. Patent No. 12767908). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12767908

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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