The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Jul. 25, 2023
Applicant:

Ebara Corporation, Tokyo, JP;

Inventor:

Seungho Yun, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/015 (2012.01); B24B 49/10 (2006.01); B24B 49/14 (2006.01);
U.S. Cl.
CPC ...
B24B 37/015 (2013.01); B24B 49/10 (2013.01); B24B 49/14 (2013.01);
Abstract

A polishing apparatus capable of measuring a surface temperature of a substrate while suppressing shielding by a polishing liquid is disclosed. The polishing apparatus includes a microwave detection sensor configured to generate microwave detection data by detecting microwaves, and a controller configured to determine the surface temperature of the substrate based on the microwave detection data.


Find Patent Forward Citations

Yun, Seungho. (2026). Polishing apparatus with microwave detection sensor (U.S. Patent No. 12766662). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12766662

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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