The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Aug. 24, 2022
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventor:

Tadashi Maegawa, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/14 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
B08B 3/14 (2013.01); H10P 72/0416 (2026.01);
Abstract

A control unit supplies a discharge liquid used in a second half of washing process by a washing process unit to a washing process unit, and supplies the discharge liquid used in a second half of the washing process by the washing process unit to the washing process unit. Since the discharge liquid used in the washing process unit is reused in the washing process unit and the discharge liquid used in the washing process unit is reused in the washing process unit, a supply amount of pure water from a supply pipe to the washing process unit and the washing process unit can be reduced. Therefore, by recycling the pure water, a consumption amount of the pure water in the washing process can be reduced.


Find Patent Forward Citations

Quick Actions:

Maegawa, Tadashi. (2026). Substrate processing apparatus and substrate processing method (U.S. Patent No. 12766566). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12766566

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…