The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

May. 04, 2023
Applicants:

Schott Ag, Mainz, DE;

Schott Primoceler Oy, Tampere, FI;

Inventors:

Jens Ulrich Thomas, Mainz, DE;

Antti Määttänen, Tampere, FI;

Petri Rokka, Tampere, FI;

Assignees:

SCHOTT AG, Mainz, DE;

SCHOTT Primoceler Oy, Tampere, FI;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10P 74/00 (2026.01); B23K 26/03 (2006.01); B23K 26/20 (2014.01); B23K 26/28 (2014.01); B23K 31/12 (2006.01); H10P 74/20 (2026.01); H10W 76/60 (2026.01); H10W 95/00 (2026.01); B23K 103/18 (2006.01);
U.S. Cl.
CPC ...
H10P 74/232 (2026.01); H10P 74/203 (2026.01); H10W 76/60 (2026.01); H10W 95/00 (2026.01); B23K 26/032 (2013.01); B23K 26/206 (2013.01); B23K 26/28 (2013.01); B23K 31/125 (2013.01); B23K 2103/18 (2018.08);
Abstract

A process for producing and/or checking an assembly of a substrate stack includes: planarly arranging at least one first substrate against a second substrate to form the substrate stack, the at least one first substrate and the second substrate being arranged directly against one another or on one another, so that at least one contact area is formed between the least one first substrate and the second substrate at which the at least one first substrate is in direct planar contact with the second substrate, the at least one first substrate including a transparent material; detecting a radiative reflection which comes about through irradiation of the substrate stack with a radiative input on the at least one contact area; and ascertaining a first bond quality index (Q) of the contact area from the radiative reflection.


Find Patent Forward Citations

Thomas, Jens. (2026). Method for checking and producing a composite of a substrate stack, and hermetically sealed enclosure produced according to said method (U.S. Patent No. 12765328). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12765328

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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