The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Feb. 03, 2023
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Kwang Ryul Kim, Chungcheongnam-do, KR;
Yun Sang Kim, Chungcheongnam-do, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/00 (2026.01); B23K 26/0622 (2014.01); H01J 37/32 (2006.01); H01S 3/00 (2006.01); H01S 3/094 (2006.01);
U.S. Cl.
CPC ...
H10P 72/0436 (2026.01); B23K 26/0622 (2015.10); H01J 37/32449 (2013.01); H01S 3/0057 (2013.01); H01S 3/094076 (2013.01);
Abstract
A substrate treating apparatus includes a process chamber having a processing space in which a substrate is plasma-treated and a laser irradiation unit irradiating the substrate with a plurality of lasers having different pulse widths to heat the substrate to reach a temperature at which the substrate is plasma-treated.
Kim, Kwang. (2026). Substrate treating apparatus and substrate treating method (U.S. Patent No. 12765306). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12765306
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile