The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Sep. 19, 2023
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Toyohisa Tsuruda, Koshi City, JP;

Hiroshi Marumoto, Koshi City, JP;

Suguen Lee, Koshi City, JP;

Masashi Enomoto, Koshi City, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G06N 20/00 (2019.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0424 (2026.01); G06N 20/00 (2019.01); H10P 72/0414 (2026.01); H10P 72/0604 (2026.01);
Abstract

An etching control device includes an updating unit configured to update, to optimize a model indicating a relationship between distribution of an etching amount within a surface of a substrate and a process parameter, which is a parameter of controlling operations of multiple nozzles configured to etch the substrate, a parameter of the model; a calculator configured to calculate the process parameter corresponding to distribution of a designated etching amount by using the model whose parameter has been updated by the updating unit; and an operation controller configured to control the operations of the multiple nozzles by using the process parameter.


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Tsuruda, Toyohisa. (2026). Etching control device, etching control method, and etching control system (U.S. Patent No. 12765304). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12765304

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