The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Jul. 11, 2023
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Anhao Cheng, Taichung City, TW;

Ke-Jing Yu, Kaohsiung City, TW;

Meng-I Kang, Changhua County, TW;

Yen-Liang Lin, Tainan City, TW;

Ching Lee, Hsinchu City, TW;

Pi-Tzu Chen, Taoyuan City, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 89/10 (2025.01); G06F 30/398 (2020.01); H10P 52/40 (2026.01);
U.S. Cl.
CPC ...
H10D 89/10 (2025.01); G06F 30/398 (2020.01); H10P 52/403 (2026.01);
Abstract

A method is provided. The method includes the following steps: identifying a first intellectual property (IP) block and a second IP block in an integrated circuit; identifying a small border region between the first IP block and the second IP block, wherein the small border region has a width in a first horizontal direction, and the width is between a small border region dimension lower limit and a small border region dimension upper limit; and inserting at least one small dummy gate feature pattern in the small border region.


Find Patent Forward Citations

Cheng, Anhao. (2026). Small dummy poly pattern insertion in small border regions (U.S. Patent No. 12765069). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12765069

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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