The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Aug. 08, 2023
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventor:

Mahalingam Nandakumar, Richardson, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/822 (2006.01); H10D 84/03 (2025.01); H10D 86/85 (2025.01); H10P 30/20 (2026.01); H10P 30/22 (2026.01);
U.S. Cl.
CPC ...
H10D 84/038 (2025.01); H10D 86/85 (2025.01); H10P 30/204 (2026.01); H10P 30/21 (2026.01); H10P 30/22 (2026.01);
Abstract

Fabrication of an integrated circuit includes forming a photoresist layer over a substrate. Target regions defined on the substrate are exposed using a reticle that defines a first exposure window for a first doped structure of a first type; the first exposure window has a first plurality of openings and a first plurality of dopant blocking regions. A respective exposure dose for each of the target regions is determined by an exposure map and provides controlled variations in the size of the first plurality of openings across the plurality of target regions. Subsequent to the exposure and to developing the photoresist, a dopant is implanted into the substrate through the first plurality of openings.


Find Patent Forward Citations

Nandakumar, Mahalingam. (2026). Reducing cross-wafer variability for minimum width resistors (U.S. Patent No. 12765042). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12765042

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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