The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Feb. 10, 2022
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Naoto Hayasaka, Miyagi, JP;

Tomoyuki Takahashi, Miyagi, JP;

Yuki Kawada, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01J 37/32 (2006.01); H10P 50/24 (2026.01); H10P 72/72 (2026.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); H01J 37/32091 (2013.01); H01J 37/3244 (2013.01); H01J 37/32623 (2013.01); H01J 37/32715 (2013.01); H10P 50/242 (2026.01); H10P 72/722 (2026.01); H10P 72/7606 (2026.01); H10P 72/7611 (2026.01); H10P 72/7612 (2026.01); H01J 2237/334 (2013.01);
Abstract

There is a substrate support for use in a plasma processing apparatus, the substrate support comprising: a base; a ceramic plate disposed on the base, the ceramic plate having a substrate supporting region and a ring supporting region surrounding the substrate supporting region; an insulating annular member disposed around the base and the ceramic plate; a fixed edge ring having an inner portion and an outer portion, the inner portion being supported on the ring supporting region, the outer portion being supported on the insulating annular member, the outer portion having a first width; a movable edge ring disposed above the outer portion of the fixed edge ring, the movable edge ring having a second width smaller than the first width; and an actuator configured to vertically move the movable edge ring with respect to the fixed edge ring.


Find Patent Forward Citations

Hayasaka, Naoto. (2026). Substrate support, plasma processing system, and plasma etching method (U.S. Patent No. 12763293). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12763293

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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