The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Aug. 08, 2023
Applied Materials Israel Ltd., Rehovot, IL;
Yehuda Zur, Rehovot, IL;
Gal Bruner, Rehovot, IL;
APPLIED MATERIALS ISRAEL LTD., Rehovot, IL;
Abstract
A method of determining a depth of a feature formed in a first region of a sample, by: positioning a test structure with known dimensions in a processing chamber having a charged particle column tilted at a first tilt angle and first rotational angle; determining the first tilt angle and first rotational angle by: taking an image of the test structure with the charged particle column tilted at the first tilt angle and the first rotational angle, measuring, based on the image, distances between multiple edges of the test structure aligned with each other along a vector, determining ratios between the measured distances, and determining a calculated tilt angle and a calculated rotational angle of charged particle column from the ratios and the known dimensions of the structure; transferring the test structure out of the processing chamber and positioning the sample in the processing chamber such that the first region is under a field of view of the charged particle column; taking a first image of the feature with the column tilted at the first tilt angle and first rotational angle and taking a second image of the feature with the column is tilted at a second tilt angle, different than the first tilt angle, and a second rotational angle; and using stereoscopic measurement techniques to determine the depth of the feature based on the first and second images and the calculated tilt angle and calculated rotational angle.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile