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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12762678 B1

PDFFull Text
Date of Patent:
Oct. 13, 2026

Filed:

Jan. 08, 2021

Hidden defect detection and epe estimation based on the extracted 3d information from e-beam images

Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Maxim Pisarenco, Son en Breugel, NL;

Scott Anderson Middlebrooks, Duizel, NL;

Markus Gerardus Martinus Maria Van Kraaij, Eindhoven, NL;

Adrianus Cornelis Matheus Koopman, Hilversum, NL;

Assignee:

ASML Netherlands B. V., Veldhoven, NL;

Attorney:

Finnegan, Henderson, Farabow, Garrett & Dunner LLP

Primary Examiner:

Isiaka O Akanbi

Int. Cl.
CPC ...
H01J 37/22 (2006.01); G03F 7/00 (2006.01); G06T 5/50 (2006.01); G06T 7/00 (2017.01); G06T 7/70 (2017.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G03F 7/705 (2013.01); G03F 7/70608 (2013.01); G06T 5/50 (2013.01); G06T 7/70 (2017.01); H01J 37/222 (2013.01); H01J 37/28 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20221 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A method for determining the existence of a defect in a printed pattern may include obtaining a) a captured image of a printed pattern from an image capture device, and b) a simulated image of the printed pattern generated by a process model. The method may include generating a combined image as a weighted combination of portions of the captured image and the simulated image. The method may include determining whether a defect exists in the printed pattern based on the combined image.

Find Patent Forward Citations

Pisarenco, Maxim. (2026). Hidden defect detection and epe estimation based on the extracted 3d information from e-beam images (U.S. Patent No. 12762678). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12762678

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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