The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Jul. 17, 2024
Applied Materials, Inc., Santa Clara, CA (US);
Chiahung Kao, Keelung City, TW;
Yen-Te Lee, Taoyuan, TW;
Fuchyi Yang, San Jose, CA (US);
Ulrich Mueller, Berkeley, CA (US);
Wei-Chung Chen, Kaohsiung City, TW;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A digital lithography system includes a light source configured to emit a light beam along an optical path toward a substrate via one or more optical elements. The digital lithography system further includes a digital micro-mirror device (DMD) configured to receive the light beam and form an output light beam. The output light beam is emitted along the optical path toward the substrate. The digital lithography system further includes an imaging device configured to capture an image of the substrate illuminated at least in part by the output light beam. A first optical path length corresponding to the DMD and a second optical path length corresponding to the imaging device are unequal.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile