The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Feb. 24, 2023
Fujifilm Corporation, Tokyo, JP;
Tsutomu Yoshimura, Haibara-gun, JP;
Akiyoshi Goto, Haibara-gun, JP;
Kyohei Sakita, Haibara-gun, JP;
Kazuhiro Marumo, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are an actinic ray-sensitive or radiation-sensitive resin composition having excellent defect suppressing properties, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition according to an embodiment is an actinic ray-sensitive or radiation-sensitive resin composition including a resin A having a repeating unit al having a group represented by any one of General Formula (1), (2), (3), (4), (5), or (6), which is a nonionic group that decomposes upon irradiation with actinic rays or radiation, and an additive B that is at least any one of an acid having an acid group having a pKa of −3.60 or more, or a salt having a structure in which a hydrogen atom of an acid group having a pKa of −3.60 or more is substituted with a cation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile