The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Sep. 27, 2024
Applicant:

Horiba Stec, Co., Ltd., Kyoto, JP;

Inventors:

Seiji Higuchi, Kyoto, JP;

Ryosuke Ogaki, Kyoto, JP;

Takayuki Ueda, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 11/14 (2006.01); G01B 11/14 (2006.01);
U.S. Cl.
CPC ...
G01B 11/14 (2013.01);
Abstract

The present invention is to accurately measure a dimension of a pattern by using statistical outlier processing, and is a pattern measurement device for measuring a dimension of a pattern formed on a sample. The pattern measurement device includes: a dimension measurement unit configured to measure a dimension of the pattern; an outlier removal unit configured to execute outlier processing at least twice on a plurality of dimension values measured by the dimension measurement unit; and a representative value determination unit configured to obtain a representative dimension value of the pattern from one or a plurality of the dimension values from which an outlier has been removed by the outlier removal unit.


Find Patent Forward Citations

Higuchi, Seiji. (2026). Pattern measurement device, pattern measurement program, and pattern measurement method (U.S. Patent No. 12761014). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12761014

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…