The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Jul. 07, 2022
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Kwang Ryul Kim, Suwon-si, KR;
Yun Sang Kim, Seongnam-si, KR;
Assignee:
SEMES CO., LTD., Cheonan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 70/00 (2026.01); G02B 27/30 (2006.01); H01S 3/00 (2006.01);
U.S. Cl.
CPC ...
H10P 70/12 (2026.01); G02B 27/30 (2013.01); H01S 3/0014 (2013.01); H01S 3/005 (2013.01);
Abstract
A dry-type cleaning apparatus for wafers for dry cleaning of organic residues on a wafer surface includes a laser emitting laser light, an optical collimator receiving the laser light emitted from the laser and generating a first collimated laser light, an energy spreader uniformizing an energy distribution of the first collimated light received from the optical collimator, and a beam expander adjusting a diameter of the first collimated laser light passing through the energy spreader according to a diameter of a wafer to generate second laser light.